Hydrogen Silsesquioxane EBL Resist
- Street: 17295 Boot Jack Rd, Suite A PO Box 267
- City: Ridgway
- State: Pennsylvania
- Country: United States
- Zip/Postal Code: 15853
- Contact No: +1( 814 )-7726-603
- Website: https://discheminc.com/resist-materials/
- Email: [email protected]
- Listed: April 18, 2025 11:14 am
- Expires: 1 day, 1 hour
Description
Hydrogen Silsesquioxane (HSQ) serves as a negative electron-beam lithography resist, allowing ultra-precise patterning at the nanoscale level. Known for its high contrast and etch resistance, HSQ is commonly used in applications requiring sharp, high-resolution patterns, such as MEMS, nanoelectronics, and photonic device fabrication.
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Listing ID: 4046802340c9a6ca
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- Listed by: Discheminc1
- Member Since: April 18, 2025